At the exhibition, Sumitomo Chemical will showcase gallium nitride (GaN) substrates and high-purity GaN-on-GaN epitaxial wafers. These advanced materials are poised to be key components in next-generation power devices. GaN power devices offer significant benefits, including reducing energy consumption in data center servers—where demand is rising due to artificial intelligence—and improving battery power conversion efficiency, thereby extending the driving range of electric vehicles.
1. Overview of the EventPCIM Europe 2026Date: Tuesday, June 9 to Thursday, June 11, 2026Venue: Nuremberg Exhibition Centre, Nuremberg, GermanyWebsite: https://pcim.mesago.com/nuernberg/en.htmlSumitomo Chemical’s booth number: Hall 6-131 (Interactive Hall Plan)
2. Overview of the EventSumitomo Chemical’s ExhibitionsGaN substratesSumitomo Chemical is actively advancing the development of 6-inch GaN substrates to address the wafer size requirements for power semiconductor processing. Leveraging over a decade of experience in the mass production of 2-inch GaN substrates for laser applications, the company is enhancing its crystal growth and processing technologies to achieve superior crystal quality. This initiative is aimed at facilitating the development of smaller, more efficient power devices.
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GaN substrates: From the right, the image shows 2-inch GaN substrate (mass-produced), 4-inch GaN substrates (mass-produced), and five 6-inch GaN substrates (currently under development) (*)
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6-inch GaN substrate (currently under development) (*)
* This article is based on results obtained from a project subsidized by the New Energy and Industrial Technology Development Organization (NEDO).
Contact
Sumitomo Chemical Co., Ltd.Advanced Inorganic Products DivisionSCIOCS DepartmentPhone: +81-3-5201-0324/sciocs/english/
]]>As semiconductors become more highly integrated and are required to deliver increasingly higher performance, there is growing demand for semiconductor encapsulant materials with reduced radiation, such as alpha radiation, which can trigger malfunctions in advanced semiconductors, as well as improved heat dissipation properties. Dongwoo Fine-Chem Co., Ltd., a wholly-owned Korean subsidiary of Sumitomo Chemical, has successfully developed a new product line that meets these needs: the ELA series of low alpha radiation, high-purity fine spherical alumina products, the world’s first of its kind (*3).
The ELA series offers the advantages of having both extremely low radiation levels and excellent heat dissipation properties. These features make it particularly well suited for applications that require a high level of reliability, such as advanced semiconductors for AI. In addition, its particle size can be precisely controlled to within several micrometers or less, and its surface properties can be customized to suit specific applications to meet the needs of customers.
Sumitomo Chemical is also expanding its lineup of high-purity alumina products for use in ceramic equipment materials and process materials, as performance requirements for these applications are becoming increasingly rigorous due to advances in the semiconductor manufacturing process. For its previously launched NXA series of ultra-fine alumina products, the Company is working with customers to explore ways to take full advantage of the product line’s high performance potential, and has verified that the use of the NXA series has led to significant performance improvement in these applications.
In recent years, as the advanced semiconductor market has seen increased demand for even higher performing peripheral materials, expectations for solutions using inorganic materials have grown. By positioning its ELA series and NXA series as key product lines that will drive growth in its high-purity alumina business, Sumitomo Chemical will work to globally expand its sales in the field of advanced semiconductors. The Company will also strive to strengthen its collaborations with customers and advance the development of new grades of high-purity alumina to meet customer needs. In doing so, it will continue to contribute to the growth of the semiconductor industry, which supports digital innovations such as AI and data communications, and the achievement of a smart society.
*1 Purity levels of 99.99% or higher*2 Alumina is made by heating aluminum hydroxide at high temperatures.*3 As of the publication of this press release on May 7, 2026; based Sumitomo Chemical’s own research
Features of the ELA series of low alpha radiation, high-purity fine spherical alumina products・ Low alpha radiation: Minimizes radiation, including alpha radiation, that may lead to malfunctions in advanced semiconductors. Suited for use in advanced packaging.・ Excellent heat dissipation properties: Excellent heat dissipation properties that help enhance the heat dissipation performance of encapsulants.・ Customizable fine spherical particles: Particle size can be controlled to within several micrometers or less, and surface properties can be modified to suit specific applications.
「ELA-2000UF」 「ELA-500UF」
Features of sintered ceramics using the NXA series of ultra-fine alumina products・ Bending strength: Approximately 1.5 times higher than that of sintered ceramics using the Company’s existing fine alumina products・ Plasma resistance: Approximately 2 times higher than that of sintered ceramics using the Company’s existing fine alumina products・ Characteristics of sintered ceramics: High density and fine structureThe NXA series, which also provides translucence, is increasingly used in applications that require optical properties and sophisticated product design.
Microstructure of sintered ceramics Microstructure of sintered ceramics using NXA-100 using the Company’s existing fine alumina AKP-50
From left: NXA-100, NXA-150, and AKP-50, an existing fine alumina product
Reference
Sumitomo Chemical’s Product Databook /english/products/files/docs/en_a06008.pdf
]]>Mitsui Chemicals, Inc.Idemitsu Kosan Co.,Ltd.Sumitomo Chemical Co., Ltd.
Mitsui Chemicals, Inc. (head office: Chuo-ku, Tokyo; President & CEO: Satoshi Ichimura; hereinafter “Mitsui”), Idemitsu Kosan Co.,Ltd. (head office: Chiyoda-ku, Tokyo; Representative Director, President: Noriaki Sakai; hereinafter “Idemitsu”), and Sumitomo Chemical Co., Ltd. (head office: Chuo-ku, Tokyo; Representative Director and President: Nobuaki Mito; hereinafter “Sumitomo Chemical”) announced on September 10, 2025, a basic agreement regarding the integration of the polyolefin (PO) business operated by Prime Polymer Co., Ltd. (head office: Chuo-ku, Tokyo; President: Yukiharu Goto; hereinafter “PRM”), a joint venture between Mitsui and Idemitsu, with Sumitomo Chemical’s polypropylene (PP) business and linear low-density polyethylene (LLDPE) business in Japan (such integration, the “Business Integration”). This integration aims to realize resilient and essential businesses that support Japanese industries and to enhance the competitiveness of the PO business, including PP and polyethylene (PE), in Japan. Subsequently, on December 24, 2025, the companies announced the conclusion of a business integration agreement (“Business Integration Agreement”) and a joint venture agreement regarding the Business Integration.
For the purpose of the Business Integration, PRM and Sumitomo Chemical submitted a plan notification regarding the Business Integration to the Japan Fair Trade Commission pursuant
to the Act on Prohibition of Private Monopolization and Maintenance of Fair Trade and have been undergoing the Japan Fair Trade Commission’s review.
As a result, notice has today been received from the Japan Fair Trade Commission that it will not issue a cease-and-desist order.
Overseas merger review procedures by relevant competition authorities are currently ongoing, and the Business Integration is scheduled to be implemented after the completion of such reviews.
Reference
Contact
Mitsui Chemicals, Inc.Corporate Communications Divisionhttps://form.mitsuichemicals.com/corporate/cc_pr_csr_en?param=13
Idemitsu Kosan Co.,Ltd.Public Relations Department Public Relations Sectionhttps://www.idemitsu.com/en/contact/flow/index.html
Sumitomo Chemical Co., Ltd.Corporate Communications Dept./english/contact/public/
]]>Sumitomo Chemical has decided to construct a new facility that integrates photoresist manufacturing process technology management, quality evaluation, and analytical functions at its Osaka Works, located in Konohana-ku, Osaka, in order to further strengthen its supply system for photoresists for advanced semiconductors, including extreme ultraviolet (EUV) and argon fluoride (ArF) photoresists. The Company plans to complete the construction of this facility by the end of fiscal 2027.
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Illustration of the new facility
Photoresists are photosensitive resins used in the semiconductor manufacturing process to form circuit patterns. They are essential materials that support the miniaturization and multilayering of advanced logic and memory semiconductors. Demand for higher performance, higher quality photoresists and their stable supply is expected to continue to rise, driven by the widespread use of generative AI, the advancement of IoT, and expanding investment in data centers. Sumitomo Chemical has expanded its advanced semiconductor photoresist business by building on the organic synthesis technologies it has cultivated through its fine chemicals business and leveraging its world-class technological capabilities.
In 2022, Sumitomo Chemical built new development and evaluation facilities for photoresists at its Osaka Works, where it has, in phases, brought in advanced exposure equipment used to manufacture semiconductors to strengthen its development capabilities from material design through evaluation. To translate what is achieved in the development process into reliable product supply, more sophisticated process control in manufacturing lines is needed. It also requires a system that can manage each step of the process with high precision, from pre‑qualification of raw materials through shipment of the product. The new facility will integrate functions related to manufacturing process technology management, quality evaluation, and analysis for EUV and ArF photoresists, which were previously spread out across Osaka Works, to achieve more advanced process control. The Company will implement this project to expedite the startup of mass production and further stabilize product quality through refined process development, thereby delivering a higher level of product quality and reliability and supply stability. By enhancing the supply system for cutting-edge photoresists to seamlessly handle the whole process from development and mass production to analysis at Osaka Works, Sumitomo Chemical will further strengthen its ability to stably supply products worldwide.
The Sumitomo Chemical Group positions its semiconductor materials business as one of its growths drivers and is focusing resources on actively expanding the business. To date, the Group has steadily invested in its photoresist business, one of the strategic product categories in its semiconductor materials business, through measures such as expanding manufacturing capacity at plants in Japan, constructing new development and evaluation facilities for advanced products, and establishing new manufacturing lines in its facility in South Korea. Sales of EUV and ArF photoresists are expanding steadily, and the Company’s development of next-generation EUV photoresists, including proprietary organic molecular photoresists, is accelerating. Going forward, the Group will continue to work hard to develop new areas of semiconductor materials and contribute to achieving a smart society through the stable supply of high quality products.
Overview of the new facility
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Location |
3-1-98 Kasugadenaka, Konohana-ku, Osaka, Japan |
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Scale |
Six-story building |
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Total floor area |
Approximately 3,200 m² |
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Completion |
End of fiscal 2027 (planned) |